An integrated Re(I) photocatalyst and sensitizer that activates the formation of formic acid from reduction of CO2/Solvent effect study between DMA DMF and acetonitrile

cat	cat conc [µM]	PS	PS conc [mM]	e-D	e-D conc [M]	H-D	H-D conc [M]	solvent A	solvent B	solvent C	solv A/B/C	additives	additives conc [M]	feedstock gas	feedstock volume [mL]	intensity [kW/m²]	pH	T [°C]	λexc [nm]	t [h]	TON CO	TOF CO [TOF/min]	Φ CO [%]	TON CH4	TOF CH4 [TOF/min]	Φ CH4 [%]	TON H2	TOF H2 [TOF/min]	Φ H2 [%]	TON HCOOH	TOF HCOOH [TOF/min]	Φ HCOOH [%]	TON MeOH	TOF MeOH [TOF/min]	Φ MeOH [%]	selectivity [%] [CO;CH4;H2;HCOOH;MeOH]	Φ all [%]	Details	include
		[Ru(bpy)3][PF6]	0.8	TEOA				DMA	TEOA		4:1								405 nm	24							1.75			12.5						0%; 0%; 12.3%; 87.7%; 0%			No
		[Ru(bpy)3][PF6]	0.8	TEOA				DMF	TEOA		4:1								405 nm	24							2			15						0%; 0%; 11.8%; 88.2%; 0%			No
		[Ru(bpy)3][PF6]	0.8	TEOA				MeCN	TEOA		4:1								405 nm	24							1.5			2.5						0%; 0%; 37.5%; 62.5%; 0%			No
[Re(bpy)2(CO)2][OTf]	0.8			TEOA				DMA	TEOA		4:1								405 nm	24										10.3						n/a			No
[Re(bpy)2(CO)2][OTf]	0.8	[Ru(bpy)3][PF6]	0.8	TEOA				DMA	TEOA		4:1								405 nm	24							1.5			52						0%; 0%; 2.8%; 97.2%; 0%			No
[Re(bpy)2(CO)2][OTf]	0.8			TEOA				DMF	TEOA		4:1								405 nm	24							0.8			10.8						0%; 0%; 6.9%; 93.1%; 0%			No
[Re(bpy)2(CO)2][OTf]	0.8	[Ru(bpy)3][PF6]	0.8	TEOA				DMF	TEOA		4:1								405 nm	24							2.8			66						0%; 0%; 4.1%; 95.9%; 0%			No
[Re(bpy)2(CO)2][OTf]	0.8	[Ru(bpy)3][PF6]	0.8	TEOA				MeCN	TEOA		4:1								405 nm	24																n/a			No
[Re(bpy)2(CO)2][OTf]	0.8	[Ru(bpy)3][PF6]	0.8	TEOA				MeCN	TEOA		4:1								405 nm	24							2.8			11.5						0%; 0%; 19.6%; 80.4%; 0%			No