An integrated Re(I) photocatalyst and sensitizer that activates the formation of formic acid from reduction of CO2/Time profile in DMF

cat	cat conc [µM]	PS	PS conc [mM]	e-D	e-D conc [M]	H-D	H-D conc [M]	solvent A	solvent B	solvent C	solv A/B/C	additives	additives conc [M]	feedstock gas	feedstock volume	intensity	pH	T [°C]	λexc [nm]	t [h]	TON CO	TOF CO	Φ CO [%]	TON CH4	TOF CH4	Φ CH4 [%]	TON H2	TOF H2	Φ H2 [%]	TON HCOOH	TOF HCOOH	Φ HCOOH [%]	TON MeOH	TOF MeOH	Φ MeOH [%]	selectivity [%] [CO;CH4;H2;HCOOH;MeOH]	Φ all [%]	Details	include
[Re(bpy)2(CO)2][OTf]	0.2	[Ru(bpy)3][PF6]	0.2					DMF	TEOA		4:1								405 nm	0							0			0						n/a			No
[Re(bpy)2(CO)2][OTf]	0.2	[Ru(bpy)3][PF6]	0.2					DMF	TEOA		4:1								405 nm	8							1			12.5		93				0%; 0%; 7.4%; 92.6%; 0%	93		No
[Re(bpy)2(CO)2][OTf]	0.2	[Ru(bpy)3][PF6]	0.2					DMF	TEOA		4:1								405 nm	12							2.5			19.5		89				0%; 0%; 11.4%; 88.6%; 0%	89		No
[Re(bpy)2(CO)2][OTf]	0.2	[Ru(bpy)3][PF6]	0.2					DMF	TEOA		4:1								405 nm	24							4.5			50.5		95				0%; 0%; 8.2%; 91.8%; 0%	95		No
[Re(bpy)2(CO)2][OTf]	0.2	[Ru(bpy)3][PF6]	0.2					DMF	TEOA		4:1								405 nm	48							6			59.5		91				0%; 0%; 9.2%; 90.8%; 0%	91		No
[Re(bpy)2(CO)2][OTf]	0.2	[Ru(bpy)3][PF6]	0.2					DMF	TEOA		4:1								405 nm	72							8.5			69.25		89				0%; 0%; 10.9%; 89.1%; 0%	89		No