An integrated Re(I) photocatalyst and sensitizer that activates the formation of formic acid from reduction of CO2/Solvent effect study between DMA DMF and acetonitrile

cat	cat conc [µM]	PS	PS conc [mM]	e-D	e-D conc [M]	H-D	H-D conc [M]	solvent A	solvent B	solvent C	solv A/B/C	additives	additives conc [M]	feedstock gas	feedstock volume	intensity	pH	T [°C]	λexc [nm]	t [h]	TON CO	TOF CO	Φ CO [%]	TON CH4	TOF CH4	Φ CH4 [%]	TON H2	TOF H2	Φ H2 [%]	TON HCOOH	TOF HCOOH	Φ HCOOH [%]	TON MeOH	TOF MeOH	Φ MeOH [%]	selectivity [%] [CO;CH4;H2;HCOOH;MeOH]	Φ all [%]	Details	include
		[Ru(bpy)3][PF6]	0.8	TEOA				DMA	TEOA		4:1								405 nm	24							1.75			12.5		87				0%; 0%; 12.3%; 87.7%; 0%	87		No
		[Ru(bpy)3][PF6]	0.8	TEOA				DMF	TEOA		4:1								405 nm	24							2			15		88				0%; 0%; 11.8%; 88.2%; 0%	88		No
		[Ru(bpy)3][PF6]	0.8	TEOA				MeCN	TEOA		4:1								405 nm	24							1.5			2.5		63				0%; 0%; 37.5%; 62.5%; 0%	63		No
[Re(bpy)2(CO)2][OTf]	0.8			TEOA				DMA	TEOA		4:1								405 nm	24										10.3		100				n/a	100		No
[Re(bpy)2(CO)2][OTf]	0.8	[Ru(bpy)3][PF6]	0.8	TEOA				DMA	TEOA		4:1								405 nm	24							1.5			52		97				0%; 0%; 2.8%; 97.2%; 0%	97		No
[Re(bpy)2(CO)2][OTf]	0.8			TEOA				DMF	TEOA		4:1								405 nm	24							0.8			10.8		93				0%; 0%; 6.9%; 93.1%; 0%	93		No
[Re(bpy)2(CO)2][OTf]	0.8	[Ru(bpy)3][PF6]	0.8	TEOA				DMF	TEOA		4:1								405 nm	24							2.8			66		96				0%; 0%; 4.1%; 95.9%; 0%	96		No
[Re(bpy)2(CO)2][OTf]	0.8	[Ru(bpy)3][PF6]	0.8	TEOA				MeCN	TEOA		4:1								405 nm	24																n/a			No
[Re(bpy)2(CO)2][OTf]	0.8	[Ru(bpy)3][PF6]	0.8	TEOA				MeCN	TEOA		4:1								405 nm	24							2.8			11.5		80				0%; 0%; 19.6%; 80.4%; 0%	80		No