An integrated Re(I) photocatalyst and sensitizer that activates the formation of formic acid from reduction of CO2/Time profile in DMF

cat	cat conc [µM]	PS	PS conc [mM]	e-D	e-D conc [M]	H-D	H-D conc [M]	solvent A	solvent B	solvent C	solv A/B/C	additives	additives conc [M]	feedstock gas	feedstock volume [mL]	intensity [kW/m²]	pH	T [°C]	λexc [nm]	t [h]	TON CO	TOF CO [TOF/min]	Φ CO [%]	TON CH4	TOF CH4 [TOF/min]	Φ CH4 [%]	TON H2	TOF H2 [TOF/min]	Φ H2 [%]	TON HCOOH	TOF HCOOH [TOF/min]	Φ HCOOH [%]	TON MeOH	TOF MeOH [TOF/min]	Φ MeOH [%]	selectivity [%] [CO;CH4;H2;HCOOH;MeOH]	Φ all [%]	Details	include
[Re(bpy)2(CO)2][OTf]	0.2	[Ru(bpy)3][PF6]	0.0002	TEOA				DMF	TEOA		4:1								405 nm	0							0			0						n/a			No
[Re(bpy)2(CO)2][OTf]	0.2	[Ru(bpy)3][PF6]	0.0002	TEOA				DMF	TEOA		4:1								405 nm	8							1			12.5						0%; 0%; 7.4%; 92.6%; 0%			No
[Re(bpy)2(CO)2][OTf]	0.2	[Ru(bpy)3][PF6]	0.0002	TEOA				DMF	TEOA		4:1								405 nm	12							2.5			19.5						0%; 0%; 11.4%; 88.6%; 0%			No
[Re(bpy)2(CO)2][OTf]	0.2	[Ru(bpy)3][PF6]	0.0002	TEOA				DMF	TEOA		4:1								405 nm	24							4.5			50.5						0%; 0%; 8.2%; 91.8%; 0%			No
[Re(bpy)2(CO)2][OTf]	0.2	[Ru(bpy)3][PF6]	0.0002	TEOA				DMF	TEOA		4:1								405 nm	48							6			59.5						0%; 0%; 9.2%; 90.8%; 0%			No
[Re(bpy)2(CO)2][OTf]	0.2	[Ru(bpy)3][PF6]	0.0002	TEOA				DMF	TEOA		4:1								405 nm	72							8.5			69.25						0%; 0%; 10.9%; 89.1%; 0%			No